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Stanford Nanofabrication Facility
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Photoresist
Preferred Short Name:
Resist
Equipment Tabs
Annealing & Oxidation Equipment
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
Deposition Equipment
Equipment name or Badger ID
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No equipment matches all of the filter criteria you have set above.
Etching Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Wet Bench Flexcorr 1
wbflexcorr-1
Flexible
SNF Cleanroom Paul G Allen L107
Metals
Al
Au
Cr
Si
SiO
2
Resist
GaAs
SiN
Ti
W
Gasonics Aura Asher
gasonics
Clean
Semiclean
SNF Cleanroom Paul G Allen L107
Resist
PI
Matrix Plasma Resist Strip
matrix
Flexible
SNF Cleanroom Paul G Allen L107
Resist
PI
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si based materials
Si
SiGe
SiN
SiO
2
SiON
Poly Silicon
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
Technics Asher
technics
Flexible
SNF Cleanroom Paul G Allen L107
Resist
dimethylpolysiloxane
poly(p-xylylene)
PI
Samco PC300 Plasma Etch System
samco
Flexible
SNF Cleanroom Paul G Allen L107
Resist
Si based materials
dimethylpolysiloxane
Si
SiN
SiO
2
SiON
Various polymers
PI
Poly Silicon
Plasmaetch PE-50
plasma-etch
Flexible
SNF Exfab Paul G Allen 155 Mavericks
Resist
Projects
A Study of Analytical and Empirical Resist Reflow in the Literature
-- (Nano Nugget)
Microfluidic Device Fabrication Protocol and Troubleshooting Guide in the Stanford Flexible Cleanroom