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Stanford Nanofabrication Facility
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New Normal Rules
. ANY shadowing must be coordinated with SNF staff first.
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Photoresist
Preferred Short Name:
Resist
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
Etch Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si based materials
Si
SiGe
SiN
SiO
2
SiON
Poly Silicon
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
Drytek 100 Plasma Etcher
drytek2
All
SNF Cleanroom Paul G Allen L107
Si
SiN
Poly Silicon
Resist
C
SiO
2
PI
Gasonics Aura Asher
gasonics
Clean
Semiclean
SNF Cleanroom Paul G Allen L107
Resist
PI
Matrix Plasma Resist Strip
matrix
Flexible
SNF Cleanroom Paul G Allen L107
Resist
PI
Plasmaetch PE-50
plasma-etch
Flexible
SNF Exfab Paul G Allen 155 Mavericks
Resist
Samco PC300 Plasma Etch System
samco
Flexible
SNF Cleanroom Paul G Allen L107
Resist
Si based materials
dimethylpolysiloxane
Si
SiN
SiO
2
SiON
Various polymers
PI
Poly Silicon
Technics Asher
technics
Flexible
SNF Cleanroom Paul G Allen L107
Resist
dimethylpolysiloxane
poly(p-xylylene)
PI
Wet Bench Flexcorr 1
wbflexcorr-1
Flexible
SNF Cleanroom Paul G Allen L107
Al
Au
Cr
Si
SiO
SiO
2
Resist
Projects
A Study of Analytical and Empirical Resist Reflow in the Literature
-- (Nano Nugget)
Microfluidic Device Fabrication Protocol and Troubleshooting Guide in the Stanford Flexible Cleanroom