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Phosphine
Chemical Formula:
PH
3
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
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Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
AMAT Centurion Epitaxial System
epi2
Clean
SNF Cleanroom Paul G Allen L107
50.00 Å
-
3.00 μm
Ge
Si
SiGe
Thermco LTO Deposition Furnace
thermcoLTO
Flexible
SNF Cleanroom Paul G Allen L107
100.00 Å
-
3.00 μm
SiO
2