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Argon

Chemical Formula:

Ar

Gases Equipment Tabs

Etch Equipment Table

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched	Gases
Plasma Therm Versaline LL ICP Deep Silicon Etcher PT-DSE	Flexible	SNF Cleanroom Paul G Allen L107	Si		Ar C₄F₈ O₂ SF₆
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox	Flexible	SNF Cleanroom Paul G Allen L107	C Si3N4 SiC SiO₂	Various C-based	Ar C₄F₈ CF₄ CHF₃ H₂ He N₂ O₂
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si Si3N4 SiGe SiO₂ SiON	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten	80% He/ 20%O₂ Ar CF₄ CHF₃ Cl₂ HBr He N₂ NF₃ O₂ SF₆
Oxford III-V etcher Ox-35	Flexible	SNF Cleanroom Paul G Allen L107	GaAs	AlGaN AlInP GaN InGaP InSb	Ar BCl₃ CH₄ Cl₂ H₂ HBr N₂ O₂ SF₆
MRC Reactive Ion Etcher mrc	Flexible	SNF Cleanroom Paul G Allen L107	Metals Various Dielectrics	Metal oxides PI	Ar CHClF₂ CHF₃ O₂ SF₆
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL	Flexible	SNF Cleanroom Paul G Allen L107	Metals or metal compounds with volatile byproducts Al	GaN	Ar BCl₃ CF₄ CH₄ Cl₂ N₂ O₂ SF₆
Oxford Dielectric Etcher oxford-rie	Flexible	SNF Cleanroom Paul G Allen L107	Si3N4 SiC SiO₂ PI	C	Ar CF₄ CHF₃ N₂ O₂ SF₆

Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Fiji 1 ALD fiji1	Semiclean	SNF Cleanroom Paul G Allen L107	1.00 Å - 50.00 nm	Metal oxides Al₂O₃ HfN HfO₂ Pt Ru SiO₂ Ta₂O₅ TaN TiN TiO₂ Various Dielectrics ZrO₂
Fiji 2 ALD fiji2	Flexible	SNF Cleanroom Paul G Allen L107	1.00 Å - 50.00 nm	Metal oxides Al₂O₃ Ga₂O₃ HfN HfO₂ In₂O₃ In_xSn_yO_z MoO₃ Ni_xO_y Pt Ru Si3N4 SiO₂ SnO₂ SrO Ta₂O₅ TiN TiO₂ Various Dielectrics ZrO₂
Fiji 3 ALD fiji3	Flexible	SNF Cleanroom Paul G Allen L107	1.00 Å - 50.00 nm	Al₂O₃ HfO₂ SiO₂ TiO₂ Various Dielectrics
MVD mvd	Flexible	SNF Cleanroom Paul G Allen L107	1.00 Å - 50.00 nm	Al₂O₃ C₂₁H₄₆O₃Si C₉H₂₃NO₃Si HfO₂ HN(CH₂CH₂NH₂)₂ Various Various Dielectrics
PlasmaTherm Versaline HDP CVD System hdpcvd	All	SNF Cleanroom Paul G Allen L107	500.00 Å - 4.00 μm	Si Si3N4 SiC SiO₂ SiON
Tylanfga Forming Gas Anneal Furnace tylanfga	Semiclean	SNF Cleanroom Paul G Allen L107	100.00 Å - 100.00 Å
Tylan9 Forming Gas Anneal Furnace tylan9	Flexible	SNF Cleanroom Paul G Allen L107		SiO₂
RTA AllWin 610 aw610_r	Flexible	SNF Cleanroom Paul G Allen L107
RTA AllWin 610 aw610_l	Clean	SNF Cleanroom Paul G Allen L107
Lesker2 Sputter lesker2-sputter	Semiclean	SNF Cleanroom Paul G Allen L107	1.00 μm	Ag Al Al₂O₃ AlSi Cr Ge In_xSn_yO_z Mo Pd Ru Sc Si SiO₂ Sn Ta Ti TiN W
First Nano carbon nanotube CVD furnace cvd-nanotube	Flexible	SNF Exfab Paul G Allen L119 Año Nuevo		C