Nitrogen

Chemical Formula:

N₂

Gases Equipment Tabs

Etch Equipment Table

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched	Gases
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si based materials Si SiGe SiN SiO₂ SiON Poly Silicon	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten	80% He/ 20%O₂ Ar CF₄ CHF₃ Cl₂ HBr He N₂ NF₃ O₂ SF₆
Lam Research TCP 9400 Poly Etcher lampoly	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Si Poly Silicon	Ge SiGe	80% He/ 20%O₂ C₂F₆ CF₄ Cl₂ HBr He N₂ O₂
Oxford Dielectric Etcher oxford-rie	Flexible	SNF Cleanroom Paul G Allen L107	SiC SiN SiO₂ PI	C	Ar CF₄ CHF₃ N₂ O₂ SF₆
Oxford III-V etcher Ox-35	Flexible	SNF Cleanroom Paul G Allen L107	GaAs	AlGaN AlInP GaN InGaP InSb	Ar BCl₃ CH₄ Cl₂ H₂ HBr N₂ O₂ SF₆
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox	Flexible	SNF Cleanroom Paul G Allen L107	C SiC SiN SiO₂	Si based materials Various C-based	Ar C₄F₈ CF₄ CHF₃ H₂ He N₂ O₂
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL	Flexible	SNF Cleanroom Paul G Allen L107	Al Various Various	GaN	Ar BCl₃ CF₄ CH₄ Cl₂ N₂ O₂ SF₆
Xactix Xenon Difluoride Etcher xactix	All	SNF Cleanroom Paul G Allen L107	Ge Si SiGe		N₂ XeF₂

Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Aix-ccs aix-ccs	Clean (MOCVD)	SNF MOCVD Paul G Allen 213XA	0 - 5 μm	AlGaN AlN GaN InAlN InGaAlN InGaN InN
Aix200 aix200	Flexible	SNF MOCVD Paul G Allen 213XA	0 - 5 μm	AlAs AlGaAs GaAs GaP GaPN III-V materials InAs InGaAs InGaAsN
Aw610_l aw610_l	Clean	SNF Cleanroom Paul G Allen L107
Aw610_r aw610_r	Flexible	SNF Cleanroom Paul G Allen L107
Epi2 epi2	Clean	SNF Cleanroom Paul G Allen L107	50 Å - 3 μm	Ge Si Si SiGe
Fiji 1 fiji1	Semiclean	SNF Cleanroom Paul G Allen L107	1 Å - 50 nm	Metal oxides Al₂O₃ HfN HfO₂ Pt Ru SiO₂ Ta₂O₅ TaN TiN TiO₂ Various Dielectrics ZrO₂
Fiji 2 fiji2	Flexible	SNF Cleanroom Paul G Allen L107	1 Å - 50 nm	Metal oxides Al₂O₃ Ga₂O₃ HfN HfO₂ In₂O₃ In_xSn_yO_z MoO₃ Ni_xO_y Pt Ru SiN SiO₂ SnO₂ SrO Ta₂O₅ TiN TiO₂ Various Dielectrics ZrO₂
Fiji 3 fiji3	Flexible	SNF Cleanroom Paul G Allen L107	1 Å - 50 nm	Al₂O₃ HfO₂ SiO₂ TiO₂ Various Dielectrics
Lesker2 Sputter lesker2-sputter	Semiclean	SNF Cleanroom Paul G Allen L107	1 μm	Ag Al Al₂O₃ AlSi Cr Ge In_xSn_yO_z Mo Pd Ru Sc Si SiO₂ Sn Ta Ti TiN W
PlasmaTherm Shuttlelock PECVD System ccp-dep	All	SNF Cleanroom Paul G Allen L107	100 Å - 4 μm
PlasmaTherm Versaline HDP CVD System hdpcvd	All	SNF Cleanroom Paul G Allen L107	500 Å - 4 μm
Savannah savannah	Flexible	SNF Cleanroom Paul G Allen L107	1 Å - 50 nm	Metal oxides Al₂O₃ Al_xZn_yO_x Ga₂O₃ HfO₂ SnO₂ TiO₂ Various Dielectrics ZnO₃ ZrO₂
Teos2 teos2	Clean	SNF Cleanroom Paul G Allen L107	50 Å - 5 μm	SiO₂
Thermco1 thermco1	Clean	SNF Cleanroom Paul G Allen L107	25 Å - 2 μm	SiO₂
Thermco3 thermco 3	Clean	SNF Cleanroom Paul G Allen L107	25 Å - 2 μm	SiO₂
Thermco4 thermco4	Flexible	SNF Cleanroom Paul G Allen L107	25 Å - 2 μm	SiO₂
ThermcoLTO thermcoLTO	Flexible	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	SiO₂
ThermcoNitride thermconitride1	Clean	SNF Cleanroom Paul G Allen L107	100 Å - 2 μm	SiN
ThermcoPoly1 thermcopoly1	Clean	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	Ge Si Si SiGe
ThermcoPoly2 thermcopoly2	Flexible	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	Ge Si Si SiGe
Tylan9 tylan9	Flexible	SNF Cleanroom Paul G Allen L107		SiO₂
TylanBPSG tylanbpsg	Clean Semiclean	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	SiO₂
Tylanfga tylanfga	Semiclean	SNF Cleanroom Paul G Allen L107	100 Å - 100 Å

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Nitrogen

Gases Equipment Tabs