Photolithography is the process used to transfer patterns of geometric shapes to a flat substrate. The substrates are first coated with a material called resist, then light (called optical photolithography) is used to catalyze reactions in the resist to create the shape of the pattern. The resist is then developed to separate the un-reacted and reacted portions, leaving a pattern on the substrate. The patterned resist can be used to pattern your material of choice with additional processes like etching or liftoff.
The SNF has various types of equipment that use light to create patterns in the resist. There are other methods which use electron beams (called e-beam lithography) instead and those processes can be done in the SNSF.
The subcategories list the equipment that perform the different steps of the lithography process.