Skip to content
Skip to navigation
SUNetID Login
SUNetID Login
Stanford Nanofabrication Facility
Navigation menu
Home
Parylene
Chemical Formula:
poly(p-xylylene)
Equipment Tabs
Annealing & Oxidation Equipment
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
PDS 2010 LABCOTER™ 2 Parylene Deposition System
parcoater
Flexible
SNF Exfab Paul G Allen 155 Mavericks
poly(p-xylylene)
Etching Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si based materials
Si
SiGe
SiN
SiO
2
SiON
Poly Silicon
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
Technics Asher
technics
Flexible
SNF Cleanroom Paul G Allen L107
Resist
dimethylpolysiloxane
poly(p-xylylene)
PI
Projects
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Report
-- (Report)
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Presentation
-- (Presentation)