Graphene

Chemical Formula:

C

Common Name:

Below is listed the equipment where you can deposit (sorted by deposition method) and etch it, as well as interesting fab documentation regarding your material.

Equipment Tabs

Deposition Equipment

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Aixtron Black Magic graphene CVD furnace aixtron-graphene	Flexible	SNF Exfab Paul G Allen L119 Año Nuevo		C

Etch Equipment

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si based materials Si SiGe SiN SiO₂ SiON Poly Silicon	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten

Projects

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Graphene

Equipment Tabs