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Clean (MOCVD)

The "Clean (MOCVD)" cleanliness group is part of the SNF/ExFab contamination policy.

The following is a list of equipment that fall into the "Clean (MOCVD)" category.

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Equipment name & NEMO ID Training Required & Chargessort descending Cleanliness Location Notes
Aixtron MOCVD - III-N system
aix-ccs
MOCVD - III-N Aixtron training Clean (MOCVD) SNF MOCVD Paul G Allen 213XA

N and P doping available.
For Si clean: SC1, SC2, HF dip.
For Sapphire clean: SC1, SC2.
For GaN template on Si or Sapphire: Piranha, SC1, SC2.

Equipment name & NEMO ID Technique Cleanliness Material Thickness Range Materials Lab Supplied Process Temperature Range Gases Substrate Size Substrate Type Maximum Load
Aixtron MOCVD - III-N system
aix-ccs
Clean (MOCVD)
0.00 - 5.00 μm
400 °C - 1300 °C
,
,
,
4"x1, 2"X3, pieces