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Diethylenetriamine
Preferred Short Name:
DETA
Chemical Formula:
HN(CH
2
CH
2
NH
2
)
2
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
MVD
mvd
Flexible
SNF Cleanroom Paul G Allen L107
1.00 Å
-
50.00 nm
Al
2
O
3
C
21
H
46
O
3
Si
C
9
H
23
NO
3
Si
HfO
2
HN(CH
2
CH
2
NH
2
)
2
Various
Various Dielectrics
Projects
Molecular Vapor Deposition and Patterning of Organosilane Self- Assembled Monolayers for Directed Growth of Neuron Cells- Final Report
-- (Report)
Molecular Vapor Deposition and Patterning of Organosilane Self-Assembled Monolayers for Directed Growth of Neuron Cells- Final Presentation
-- (Presentation)
