Developers remove resist in UV-exposed areas (positive resists) or in UV-protected areas (negative resists) using an acid or base to dissolve the resist. The developer chemical required will depend on the specific resist used.
|Equipment name & Badger ID||Training Required & Charges||Cleanliness||Location||Chemicals||Notes|
Wet Bench Miscellaneous
|Wet Bench Miscellaneous Photoresist Training||SNF Cleanroom Paul G Allen L107||
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!