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Stanford Nanofabrication Facility
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Si based materials
Equipment Tabs
Annealing & Oxidation Equipment
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Deposition Equipment
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Etching Equipment
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Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si based materials
Si
SiGe
SiN
SiO
2
SiON
Poly Silicon
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
Flexible
SNF Cleanroom Paul G Allen L107
C
SiC
SiN
SiO
2
Si based materials
Various C-based
Samco PC300 Plasma Etch System
samco
Flexible
SNF Cleanroom Paul G Allen L107
Resist
Si based materials
dimethylpolysiloxane
Si
SiN
SiO
2
SiON
Various polymers
PI
Poly Silicon
Projects
Electron beam lithography for ultra-low-loss photonic devices and systems