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Stanford Nanofabrication Facility
SNF is open under
New Normal Rules
. ANY shadowing must be coordinated with SNF staff first.
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Tetraethyl Orthosilicate
Chemical Formula:
Si(OC
2
H
5
)
4
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Teos2
teos2
Clean
SNF Cleanroom Paul G Allen L107
50 Å
-
5 μm
SiO
2