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6 inch wafer

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6"
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Equipment name & NEMO IDsort ascending Training Required & Charges Cleanliness Location Notes
Tystar Bank 2 Tube 5
B2T5 Clean Oxide Anneal 		Tystar Atmospheric Tube Training Clean SNF Cleanroom Paul G Allen L107
Tystar Bank 1 Tube 2
B1T2 Flexible Oxide Anneal 		Tystar Atmospheric Tube Training Flexible SNF Cleanroom Paul G Allen L107
Tystar Bank 1 Tube 1
B1T1 Flexible Oxide 		Tystar Atmospheric Tube Training Flexible SNF Cleanroom Paul G Allen L107
Thermco3 Oxidation Furnace
thermco 3 		Thermco 3 Oxidation Furnaces Training Clean SNF Cleanroom Paul G Allen L107

Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
Tencor P2 Profilometer
p2 		Tencor P2 Profilometer Training Clean, Semiclean SNF Cleanroom Paul G Allen L107

Step height measurement range 500 Å to 80 µm
Technics Asher
technics 		Technics Asher Training Flexible SNF Cleanroom Paul G Allen L107
SPTS uetch vapor etch
uetch 		SPTS uetch vapor etch Training All SNF Cleanroom Paul G Allen L107

Pieces need a carrier wafer; Isotropic Etching
Sinton Lifetime Tester
sinton-lifetime-tester 		Sinton Lifetime Tester Training Flexible SNF Exfab Paul G Allen 151 Ocean
Sensofar S-neox
s-neox 		Sensofar S-neox Training All SNF Cleanroom Paul G Allen L107

non contact 3D optical profiling
SEM -Zeiss Merlin
sem-merlin 		SEM-Merlin Training All SNF Exfab Paul G Allen 104 Stinson
Savannah ALD
savannah 		ALD Savannah Training Flexible SNF Cleanroom Paul G Allen L107
Samco PC300 Plasma Etch System
samco 		Samco Training Flexible SNF Cleanroom Paul G Allen L107
RTA AllWin 610
aw610_r 		AllWin 610 RTA Training Flexible SNF Cleanroom Paul G Allen L107
RTA AllWin 610
aw610_l 		AllWin 610 RTA Training Clean SNF Cleanroom Paul G Allen L107
Prometrix Resistivity Mapping System
prometrix 		Prometrix Training All SNF Cleanroom Paul G Allen L107

3 Probe Heads for different cleanliness groups.
Profilometer AlphaStep D-300
alphastep2 		AlphaStep2 Training Flexible SNF Exfab Paul G Allen 104 Stinson
Profilometer Alphastep 500
alphastep 		Alphastep 500 Profilometer Training Flexible SNF Exfab Paul G Allen 104 Stinson

500Å to 300µm
Plasmaetch PE-50
plasma-etch 		Plasmaetch PE-50 Training Flexible SNF Exfab Paul G Allen 155 Mavericks

Low power, high pressure plasma; low bias, minimal damage. Often used for surface treatment At SNF - nSiL lab
Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL 		Plasma Therm Versaline LL ICP Metal Etcher Training Flexible SNF Cleanroom Paul G Allen L107

Single wafer; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; Restrictions: Can not etch metals or metal oxides with no volatile by-products (shorting & arcing issues)
Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox 		Plasma Therm Versaline LL ICP Dielectric Etcher Training Flexible SNF Cleanroom Paul G Allen L107

Single wafer; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; Restrictions: Can not etch metals or metal oxides with no volatile by-products (shorting & arcing issues)

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Equipment name & NEMO IDsort ascending Technique Cleaning Required Cleanliness Primary Materials Etched Other Materials Etched Material Thickness Range Materials Lab Supplied Process Temperature Range Gases Sample Size Limits Substrate Size Substrate Type Maximum Load
Tystar Bank 2 Tube 5
B2T5 Clean Oxide Anneal
Pre-Diffusion Clean Clean
25.00 Å - 2.00 μm
400 °C - 1100 °C
(Si)
,
(SiGe)
,
(SiO2)
 100
Tystar Bank 1 Tube 2
B1T2 Flexible Oxide Anneal
Flexible
25.00 Å - 2.00 μm
400 °C - 1100 °C
(Si)
,
(SiGe)
,
(SiO2)
 100
Tystar Bank 1 Tube 1
B1T1 Flexible Oxide
Flexible
25.00 Å - 2.00 μm
400 °C - 1100 °C
(Si)
,
(SiGe)
,
(SiO2)
 100
Thermco3 Oxidation Furnace
thermco 3
Pre-Diffusion Clean Clean
25.00 Å - 2.00 μm
700 °C - 1100 °C
50
Tencor P2 Profilometer
p2
Clean, Semiclean
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(GaN)
,
(III-V)
,
(GaAs)
 1
Technics Asher
technics
Flexible
(Si)
,
(SiO2)
,
(SiO2)
 Four 4" wafers to pieces, one 6" or 8" wafer
SPTS uetch vapor etch
uetch
All
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(SiC)
,
(GaN)
,
(III-V)
,
(GaAs)
 1
Sinton Lifetime Tester
sinton-lifetime-tester
Flexible
Sensofar S-neox
s-neox
All
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(GaN)
,
(III-V)
,
(GaAs)
 1
SEM -Zeiss Merlin
sem-merlin
All
0.00 mm - 35.00 mm
6 in wafer
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(SiC)
,
(GaN)
,
(III-V)
,
(GaAs)
,
(LiNb)
Savannah ALD
savannah
Flexible
1.00 Å - 50.00 nm
24 °C - 250 °C
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(SiC)
,
(GaN)
,
(III-V)
,
(Various)
,
(Various)
,
(LiNb)
,
(Various)
Samco PC300 Plasma Etch System
samco
Flexible
20 ºC
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(SiC)
,
(GaN)
,
(III-V)
,
(GaAs)
,
(Various)
,
(Various)
,
(LiNb)
,
(Various)
 Four 4" wafers or two 6" wafers and one 8" wafer
RTA AllWin 610
aw610_r
Flexible
21 °C - 1150 °C
(Si)
,
(SiGe)
,
(SiO2)
RTA AllWin 610
aw610_l
Pre-Diffusion Clean Clean
21 °C - 1150 °C
(Si)
,
(SiGe)
,
(SiO2)
 1 wafer
Prometrix Resistivity Mapping System
prometrix
All
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(GaN)
,
(III-V)
,
(GaAs)
 1
Profilometer AlphaStep D-300
alphastep2
Flexible
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(SiC)
,
(GaN)
,
(III-V)
,
(GaAs)
,
(Various)
,
(Various)
,
(LiNb)
 1
Profilometer Alphastep 500
alphastep
Flexible
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(GaN)
,
(III-V)
,
(GaAs)
 1
Plasmaetch PE-50
plasma-etch
Flexible
Multiple
Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL
Flexible
1
Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
Flexible
1

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