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6 inch wafer

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6"
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Equipment name & Badger IDsort ascending Training Required & Charges Cleanliness Lab Organization Location Notes
Xactix Xenon Difluoride Etcher
xactix
Xactix Xenon Difluoride Etcher Training All
SNF
SNF Cleanroom Paul G Allen L107

Isotropic Si etching; can be used for backside Si removal on small pieces

Woollam
woollam
Woollam Training All
SNF
SNF Cleanroom Paul G Allen L107
White Oven
white-oven
White Oven Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.

Wet Bench Miscellaneous
wbmiscres
Wet Bench Miscellaneous Photoresist Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!

Wet Bench Flexible Solvents 2
wbflexsolv-2
Wet Bench Flexible Solvents 1 and 2 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual solvent cleaning, hot plate

Wet Bench Flexible Solvents 1
wbflexsolv-1
Wet Bench Flexible Solvents 1 and 2 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual solvent cleaning, two ultrasonic baths.

Wet Bench Flexible Solvents
wbflexsolv
Wet Bench Flexible Solvents 1 and 2 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual solvent cleaning of substrates or resist removal.

Wet Bench Flexcorr 4
wbflexcorr-4
Wet Bench Flexcorr 1and2 and 3and4 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual wet etching of non-standard materials. CTB. Labware for "clean" KOH or TMAH etching available. GaAs not allowed.

Wet Bench Flexcorr 3
wbflexcorr-3
Wet Bench Flexcorr 1and2 and 3and4 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual wet etching of non-standard materials. Hot Plate available. GaAs not allowed.

Wet Bench Flexcorr 2
wbflexcorr-2
Wet Bench Flexcorr 1and2 and 3and4 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual wet etching of non-standard materials. 3 hot pots available. GaAs allowed in personal labware only

Wet Bench Flexcorr 1
wbflexcorr-1
Wet Bench Flexcorr 1and2 and 3and4 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.

Wet Bench Decontamination
wbdecon
Wet Bench Decontamination Training Clean
SNF
SNF Cleanroom Paul G Allen L107

KOH or wafersaw or post-cmp decontamination

Wet Bench CMOS Metal (wbclean3)
wbclean3
Wet Bench CMOS Metal (wbclean3) Training Semiclean
SNF
SNF Cleanroom Paul G Allen L107

Al, Ti, or W wet etching or oxide etching

Wet Bench Clean_res-piranha
wbclean_res-piranha
Wet Bench Clean Piranha/HF/Phosphoric Training Clean
SNF
SNF Cleanroom Paul G Allen L107

Resist will be removed

Wet Bench Clean_res-hf
wbclean_res-hf
Wet Bench Clean Piranha/HF/Phosphoric Training Clean
SNF
SNF Cleanroom Paul G Allen L107

Resist as mask allowed

Wet Bench Clean_res- hotphos
wbclean_res-hotphos
Wet Bench Clean Piranha/HF/Phosphoric Training Clean
SNF
SNF Cleanroom Paul G Allen L107

Resist should have been removed

Wet Bench Clean 2
wbclean-2
Wet Bench Clean 1 and 2 Training Clean
SNF
SNF Cleanroom Paul G Allen L107

No resist allowed. Resist should have been removed at the wbclean_res-piranha

Wet Bench Clean 1
wbclean-1
Wet Bench Clean 1 and 2 Training Clean
SNF
SNF Cleanroom Paul G Allen L107

No resist allowed. Resist should have been removed at the wbclean_res-piranha.

Thermolyne
thermolyne
Thermolyne Muffle Furnace Training Flexible
SNF
SNF Exfab Paul G Allen 159 Capitola
ThermcoPoly2
thermcopoly2
Thermco Poly Deposition Furnace Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Standard polysilicon deposition at 620C. P and N doping available.

Pages

Equipment name & Badger IDsort ascending Technique Cleaning Required Cleanliness Primary Materials Etched Material Thickness Range Materials Lab Supplied Minimum Resolution Developer Objective Separation Process Temperature Range Chemicals Gases Substrate Size Substrate Type Maximum Load
Xactix Xenon Difluoride Etcher
xactix
All
,
,
,
,
,
,
,
,
,
1
Woollam
woollam
All
,
,
,
,
,
,
,
,
,
,
,
,
,
1
White Oven
white-oven
Flexible
0 °C - 200 °C
,
,
,
,
,
,
,
,
Wet Bench Miscellaneous
wbmiscres
Flexible
,
,
,
,
,
,
,
,
Wet Bench Flexible Solvents 2
wbflexsolv-2
Flexible
,
,
,
,
,
,
,
,
,
,
Wet Bench Flexible Solvents 1
wbflexsolv-1
Flexible
,
,
,
,
,
,
,
,
,
,
Wet Bench Flexible Solvents
wbflexsolv
Flexible
,
,
,
,
,
,
,
,
,
,
Wet Bench Flexcorr 4
wbflexcorr-4
Flexible
Wet Bench Flexcorr 3
wbflexcorr-3
Flexible
,
,
,
,
,
,
,
,
,
Wet Bench Flexcorr 2
wbflexcorr-2
Flexible
,
,
,
,
,
,
,
,
,
,
Wet Bench Flexcorr 1
wbflexcorr-1
Flexible
,
,
,
,
,
,
,
,
,
,
Wet Bench Decontamination
wbdecon
Clean
,
,
Wet Bench CMOS Metal (wbclean3)
wbclean3
Semiclean
,
,
25 wafers
Wet Bench Clean_res-piranha
wbclean_res-piranha
Clean
,
,
Wet Bench Clean_res-hf
wbclean_res-hf
Clean
,
,
Wet Bench Clean_res- hotphos
wbclean_res-hotphos
Clean
,
,
Wet Bench Clean 2
wbclean-2
Clean
,
,
25
Wet Bench Clean 1
wbclean-1
Clean
,
,
25
Thermolyne
thermolyne
Flexible
25 °C - 1000 °C
25
ThermcoPoly2
thermcopoly2
Pre-Diffusion Clean Flexible
100 Å - 3 μm
525 °C - 650 °C
44

Pages