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Introduction of HD4110 Polyimide photoresist in SNF/ExFab

PROM Request Title: 
Introduction of HD4110 Polyimide photoresist in SNF/ExFab
PROM Request Summary: 
Bring in new chemistry to use with SNF and ExFab spin coating and exposure tools.
PROM Date: 
07/29/2019
PROM Decision: 
Approved.