Skip to content Skip to navigation

ALD oxides in teos2

PROM Request Title: 
ALD oxides in teos2
PROM Request Summary: 
High quality oxides from teos2 required for devices, so contamination mitigation plan proposed to allow ALD films from Fiji1 to process in clean teos2.
PROM Date: 
08/04/2016
PROM Decision: 
Approved.