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Variable Trench Optimization for DRIE of SOI in PT-DSE
Project Type:
E241
Date:
June 2015
Areas of Interest:
DRIE, SOI, PT-DSE
Report(s):
Variable Trench Optimization for DRIE of SOI in PT-DSE- Final Report
Function and Method:
Reactive Ion Etching (RIE)
Researchers and (Mentors):
Ian Flader, Yunhan Chen, (Usha Raghuram)
List of Important Equipment:
Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE)
Presentation(s):
Variable Trench Optimization for DRIE of SOI in PT-DSE- Final Presentation
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