Skip to content
Skip to navigation
SUNetID Login
SUNetID Login
Stanford Nanofabrication Facility
Stanford Nanofabrication Facility
Navigation menu
SNF Main Menu
SNF Home
About
Lab User Guide
Main menu
Home
Surface Micromachining Method for Releasing a Range of Micron-Scale Membranes
Project Type:
E241
Date:
December 2014
Areas of Interest:
MEMS, release strategies
Report(s):
Surface Micromachining Method for Releasing a Range of Micron-Scale Membranes- Final Report
Function and Method:
Atomic Layer Deposition (ALD)
Reactive Ion Etching (RIE)
Wafer Polishing
Researchers and (Mentors):
Martin Winterkorn, Anup Dadlani, Yongmin Kim, (J Provine), (Michelle Rincon)
List of Important Equipment:
Fiji 1 (fiji1)
Fiji 2 (fiji2)
Fiji 3 (fiji3)
ThermcoPoly2 (thermcopoly2)
GnP POLI-400L (cmp)
Xactix Xenon Difluoride Etcher (xactix)
Sensofar S-neox (s-neox)
ASML PAS 5500/60 i-line Stepper (asml)
Presentation(s):
Surface micromachining method for releasing a range of micron-scale membranes- Final Presentation
Printer-friendly version