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Roughness characterization of waveguides fabricated using the Heidelberg MLA150 Maskless Aligner

Project Type: 
E241
Date: 
March 2019
Areas of Interest: 
Optical waveguides, Maskless lithography
Function and Method: 
Researchers and (Mentors): 
Payton Broaddeus, Aditi Datta, (Swaroop Kommera), (J Provine)
List of Important Equipment: 
Nano Nugget(s): 
In order to make the lowest loss waveguides, we need to find a combination of dose/defocus and reflow time/temperature that gives us the best resolution and the lowest line edge roughness and line width roughness.