Roughness characterization of waveguides fabricated using the Heidelberg MLA150 Maskless Aligner
Areas of Interest:
Optical waveguides, Maskless lithography
Researchers and (Mentors):
Payton Broaddeus, Aditi Datta, (Swaroop Kommera), (J Provine)
List of Important Equipment:
In order to make the lowest loss waveguides, we need to find a combination of dose/defocus and reflow time/temperature that gives us the best resolution and the lowest line edge roughness and line width roughness.