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Optimization of Silicon Isotropic Plasma Etch in PT-DSE for GOPHER Process

Project Type: 
E241
Date: 
December 2015
Areas of Interest: 
Optimizing Isotropic etching in the PT-DSE
Processing Technique (former Function and Method): 
Researchers and (Mentors): 
Andrew Ceballos, (Usha Raghuram)