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Mix and Match: E-beam and Optical Lithography for Optical Gratings and Waveguide
Project Type:
E241
Date:
June 2011
Areas of Interest:
Mixing Optical and E-beam Lithography
Function and Method:
Patterning
Researchers and (Mentors):
Chia-Ming Chang
List of Important Equipment:
ASML PAS 5500/60 i-line Stepper (asml)
Report(s):
Mix-and-Match: E-beam and Optical Lithography for Optical Gratings and Waveguides- Final Report
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