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Mix and Match: E-beam and Optical Lithography for Optical Gratings and Waveguide

Project Type: 
E241
Date: 
June 2011
Areas of Interest: 
Mixing Optical and E-beam Lithography
Function and Method: 
Patterning
Researchers and (Mentors): 
Chia-Ming Chang
List of Important Equipment: 
ASML PAS 5500/60 i-line Stepper (asml)
Report(s): 
Mix-and-Match: E-beam and Optical Lithography for Optical Gratings and Waveguides- Final Report