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High-k/SiO2 interface Charge Characterization for ALD tools

Project Type: 
E241
Date: 
March 2011
Areas of Interest: 
Charge density study for HfO2 and Al2o3
Function and Method: 
Researchers and (Mentors): 
Hong-Yu Chen, Luckshitha, (J Provine)
List of Important Equipment: