Grayscale lithography for chiral nanophotonic structures

Project Type:

E241

Date:

June 2018

Areas of Interest:

Grayscale lithography process development

Report(s):

Grayscale lithography for chiral nanophotonic structures: Final Report

Processing Technique (former Function and Method):

Direct Write

Researchers and (Mentors):

Jefferson Dixon, Michelle Solomon, (Swaroop Kommera)

List of Important Equipment:

Heidelberg MLA 150 (heidelberg)

Nano Nugget(s):

Helpful hints for grayscale lithography on the Heidelberg MLA 150

When using grayscale lithography on the Heidelberg, there are a few quirks that may slow down your progress. This document provides some warnings and helpful tricks to overcome the common roadblocks.

Presentation(s):

Final Presentation: Grayscale lithography for chiral nanophotonic structures