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Grayscale Lithography and Resist Reflow for Parylene Patterning
Project Type:
E241
Date:
June 2018
Areas of Interest:
Grayscale lithography modeling, Parylene liftoff process development
Report(s):
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Report
Function and Method:
Optical Photolithography
Patterning
Researchers and (Mentors):
Charmaine Chia, Joel Martis, (Swaroop Kommera)
List of Important Equipment:
Heidelberg MLA 150 (heidelberg)
PDS 2010 LABCOTER™ 2 Parylene Deposition System (parcoater)
Nano Nugget(s):
A Study of Analytical and Empirical Resist Reflow in the Literature
A summary of the main findings in the literature regarding resist reflow.Â
Presentation(s):
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Presentation
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