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Grayscale Lithography and Resist Reflow for Parylene Patterning

Project Type: 
E241
Date: 
June 2018
Areas of Interest: 
Grayscale lithography modeling, Parylene liftoff process development
Researchers and (Mentors): 
Charmaine Chia, Joel Martis, (Swaroop Kommera)
Nano Nugget(s): 

A summary of the main findings in the literature regarding resist reflow.