Skip to content
Skip to navigation
SUNetID Login
SUNetID Login
Stanford Nanofabrication Facility
SNF is open under
New Normal Rules
. ANY shadowing must be coordinated with SNF staff first.
Stanford Nanofabrication Facility
Navigation menu
SNF Main Menu
SNF Home
About
Overview
Mission
History
NNCI
Lab Spaces
Visit
Join
Overview
Getting Started in the SNF labs
Contacts
Rates
How to Join
Forms
Discussion Lists
Storage
Lab User Guide
Main menu
Home
Grayscale Lithography and Resist Reflow for Parylene Patterning
Project Type:
E241
Date:
June 2018
Areas of Interest:
Grayscale lithography modeling, Parylene liftoff process development
Function and Method:
Optical Photolithography
Patterning
Researchers and (Mentors):
Charmaine Chia, Joel Martis, (Swaroop Kommera)
List of Important Equipment:
Heidelberg MLA 150 (heidelberg)
PDS 2010 LABCOTER™ 2 Parylene Deposition System (parcoater)
Nano Nugget(s):
A Study of Analytical and Empirical Resist Reflow in the Literature
A summary of the main findings in the literature regarding resist reflow.Â
Presentation(s):
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Presentation
Report(s):
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Report
Printer-friendly version