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Electron beam lithography for ultra-low-loss photonic devices and systems

Project Type: 
nano@stanford Fellowship
Date: 
October 2019
Areas of Interest: 
Electron Beam Lithography
Function and Method: 
Ebeam
Researchers and (Mentors): 
Tim McKenna (Rich Tiberio)
Notes: 
PDF File: 
PDF icon snsf_final_report_20190115.pdf
Presentation(s): 
Overview of JEOL EBL for Curved Structures
Runsheet(s): 
220 nm SOI photonics runsheet (2018-11-7)