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Electron beam lithography for ultra-low-loss photonic devices and systems
Project Type:
nano@stanford Fellowship
Date:
October 2019
Areas of Interest:
Electron Beam Lithography
Function and Method:
Ebeam
Researchers and (Mentors):
Tim McKenna (Rich Tiberio)
Notes:
PDF File:
snsf_final_report_20190115.pdf
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Presentation(s):
Overview of JEOL EBL for Curved Structures
Runsheet(s):
220 nm SOI photonics runsheet (2018-11-7)
Materials
Si based materials
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