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Development of Four Nitride Films; TiN, Hf3N4, WN, and AlNDevelopment of Four Nitride Films; TiN, Hf3N4, WN, and AlN

Project Type: 
E241
Date: 
December 2010
Areas of Interest: 
ALD nitride films
Function and Method: 
Atomic Layer Deposition (ALD)
Researchers and (Mentors): 
Shingo Yoneoka, Yi-Hsuan, Scott Lee, Chu-En Chang, (J Provine)
List of Important Equipment: 
Savannah (savannah)
Report(s): 
ALD Nitride on Savannah- Final Report