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Developing Etching Process for Nanostructures on InGaP and AlInP Using OX-35 Etcher

Project Type: 
E241
Date: 
June 2014
Areas of Interest: 
InGaP and AlInP etching
Report(s): 
Developing Etching Process for Nanostructures on InGaP and AlInP Using OX-35 Etcher- Final Report
Processing Technique (former Function and Method): 
Dry Etching
Researchers and (Mentors): 
Jieyang Jia, Li Zhao, (Mary Tang), (Jim McVittie)
List of Important Equipment: 
Oxford III-V etcher (Ox-35)
Presentation(s): 
Developing Etching Process for Nanostructures on InGaP and AlInP Using OX-35 Etcher- Final Presentation