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Characterization of metal-nitride films deposited by the Savannah ALD system

Project Type: 
E241
Date: 
June 2011
Areas of Interest: 
ALD metal-nitride films
Processing Technique (former Function and Method): 
Atomic Layer Deposition (ALD)
Researchers and (Mentors): 
Adair Gerke, Suhas Kumar, (J Provine), (Krishna Saraswat)
List of Important Equipment: 
Savannah ALD (savannah)
Presentation(s): 
Metal Nitride Films Using ALD- Final Presentation