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ALD Dielectric Electrical Characterization
Project Type:
E241
Date:
June 2014
Areas of Interest:
High-k dielectrics, Al2O3, HfO, MOSCAP
Report(s):
ALD Dielectric Electrical Characterization- Final Report
Function and Method:
Atomic Layer Deposition (ALD)
Researchers and (Mentors):
Max Shulaker, (Michelle Rincon), (J Provine)
List of Important Equipment:
Fiji 1 (fiji1)
Fiji 2 (fiji2)
Fiji 3 (fiji3)
Savannah (savannah)
Presentation(s):
MOSCAP Characterization of SNF ALD- Final Presentation
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