SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.
The following is a list of equipment that fall into the "Flexible" category.
Equipment name & Badger ID | Training Required & Charges | Cleanliness | Lab Organization | Location | Notes |
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Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training | Flexible | SNF Cleanroom Paul G Allen L107 |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents! |
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Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip | Clean (Ge), Semiclean, Flexible | SNF Cleanroom Paul G Allen L107 |
Wet Resist Removal: SRS-100 or PRS1000 |
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White Oven white-oven |
White Oven Training | Flexible | SNF Cleanroom Paul G Allen L107 |
For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable. |
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Xplore Micro Compounder N/A |
Micro Compounder training | Flexible | SNF Exfab Paul G Allen 159 Capitola |
Equipment name & Badger ID | Technique | Cleanliness | Primary Materials Etched | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Developer | Objective Separation | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
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Wet Bench Miscellaneous wbmiscres |
Flexible |
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Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
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20 °C - 60 °C
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25 4 inch wafers | ||||||
White Oven white-oven |
Flexible |
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0 °C - 200 °C
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Xplore Micro Compounder N/A |
Flexible |
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0 °C - 400 °C
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