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Flexible

The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy.

The following is a list of equipment that fall into the "Flexible" category.

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Equipment name & NEMO ID Training Required & Chargessort ascending Cleanliness Location Notes
Finetech Lambda
flipchipbonder
Flip Chip Bonder Training Flexible SNF Exfab Paul G Allen 104 Stinson
DISCO Wafer Saw
DISCO wafersaw
Wafersaw DISCO training Flexible SNF Exfab Paul G Allen 159 Capitola
DISCO Backgrinder
disco-backgrind
Backgrinder DISCO Training Flexible SNF Exfab Paul G Allen 159 Capitola
Critical Point Dryer Tousimis Automegasamdri-915B
cpd
Critical Point Dryer Training Flexible SNF Cleanroom Paul G Allen L107

CO2 drying after release of micromachined devices

Oven BlueM 200°C to 430°C
bluem
Blue M Oven Training Flexible SNF Cleanroom Paul G Allen L107

Convection in N2. Cure. Programmable.

Biologic SP-300
biologic
Potentiostat BioLogic Training Flexible SNF Exfab Paul G Allen 155 Mavericks
Alveole Primo
alveole
Protein patterning Alveole Primo Training Flexible SNF Exfab Paul G Allen 151 Ocean
Profilometer Alphastep 500
alphastep
Alphastep 500 Profilometer Training Flexible SNF Exfab Paul G Allen 104 Stinson

500Å to 300µm

RTA AllWin 610
aw610_r
AllWin 610 RTA Training Flexible SNF Cleanroom Paul G Allen L107
Asylum AFM
afm-asylum
AFM Asylum Training Flexible SNF Exfab Paul G Allen 151 Ocean
Aixtron MOCVD - III-V system
aix200
MOCVD - III-V Aixtron training Flexible SNF MOCVD Paul G Allen 213XA

N and P doping available.
For Si clean: SC1, SC2, HF dip.
For III-V clean: HCl or HF dip.

Aixtron Black Magic graphene CVD furnace
aixtron-graphene
CVD graphene furnace Aixtron Black Magic training Flexible SNF Exfab Paul G Allen L119 Año Nuevo
MVD
mvd
MVD Training Flexible SNF Cleanroom Paul G Allen L107

Reactor located inside glovebox

Savannah ALD
savannah
ALD Savannah Training Flexible SNF Cleanroom Paul G Allen L107
Fiji 3 ALD
fiji3
ALD Fiji 3 Training Flexible SNF Cleanroom Paul G Allen L107

Restricted to non-conductive films only

Fiji 2 ALD
fiji2
ALD Fiji 1 and 2 Training Flexible SNF Cleanroom Paul G Allen L107

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Equipment name & NEMO ID Technique Cleanliness Primary Materials Etched Other Materials Etched Materials Lab Supplied Developer Process Temperature Range Chemicals Gases Substrate Size Substrate Type Maximum Load
Technics Asher
technics
Flexible
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Four 4" wafers to pieces, one 6" or 8" wafer
Thermoscientific Oven
thermoscientific-oven
Flexible
Thinky AR-100 Mixer
thinky-mixer
Flexible
Tylan9 Forming Gas Anneal Furnace
tylan9
Flexible
250 °C - 1100 °C
,
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50
Voltera
voltera
Flexible
Wet Bench Flexcorr 1
wbflexcorr-1
Flexible ,
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Wet Bench Flexcorr 2
wbflexcorr-2
Flexible ,
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Wet Bench Flexcorr 3
wbflexcorr-3
Flexible ,
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Wet Bench Flexcorr 4
wbflexcorr-4
Flexible
Wet Bench Flexible Solvents
wbflexsolv
Flexible ,
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Wet Bench Flexible Solvents 1
wbflexsolv-1
Flexible ,
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Wet Bench Flexible Solvents 2
wbflexsolv-2
Flexible ,
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Wet Bench Miscellaneous
wbmiscres
Flexible ,
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Wet Bench Resist Strip
wbresstrip-1
Clean (Ge), Semiclean, Flexible
20 °C - 60 °C
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25 4 inch wafers
Wet Bench Solvent Lithography
lithosolv
Flexible ,
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Xplore Micro Compounder
N/A
Flexible
0 °C - 400 °C

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