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Flexible

The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.

The following is a list of equipment that fall into the "Flexible" category.

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Equipment name & Badger ID Training Required & Chargessort descending Cleanliness Lab Organization Location Notes
Fumehood 1
fumehood1
Fumehood 1 Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
Fumehood 2
fumehood2
Fumehood 2 Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
Fumehood 3
fumehood3
Fumehood 3 Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
Fumehood 4
fumehood4
Fumehood 4 Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
Glovebox-l
glovebox-l
Glovebox-l Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
Glovebox-r
glovebox-r
Glovebox-r Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
GnP POLI-400L
cmp
CMP Training Flexible
SNF
SNF Exfab Paul G Allen 159 Capitola
Hummer V Sputter Coater
hummer
Hummer V Sputter Coater Training Flexible
SNF
SNF Exfab Paul G Allen L119 Año Nuevo
Ika T18 Disperser
disperser
IKA Disperser Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
Jasco UV-Vis-NIR
jasco-uv-vis-nir
Jasco UV-Vis-NIR Training Flexible
SNF
SNF Exfab Paul G Allen 151 Ocean
Epilog Fusion M2 Laser Cutter
lasercutter
Lasercutter Training Flexible
SNF
SNF Exfab Paul G Allen 155A Venice
Lithography Solvent Bench
lithosolv
Lithography Solvent Bench Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.

Malvern Dynamic Light Scattering (DLS) Zetasizer
malvern-dls
Malvern Dynamic Light Scattering (DLS) Zetasizer Training Flexible SNF Exfab Paul G Allen 155 Mavericks
Matrix Plasma Resist Strip
matrix
Matrix Plasma Resist Strip Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Chuck temperature controls wafer heating.

MRC Reactive Ion Etcher
mrc
MRC Reactive Ion Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Typically used for sputter etching; Single wafer, direct load system; wafers/ pieces can be directly placed on electrode

Optomec Printer
optomec-printer
Optomec Printer Training Flexible
SNF
SNF Exfab Paul G Allen 155A Venice
Oxford Dielectric Etcher
oxford-rie
Oxford Dielectric Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers

Oxford III-V etcher
Ox-35
Oxford III-V etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers; Restrictions: III-V materials only.

Plasma Therm Versaline LL ICP Deep Silicon Etcher
PT-DSE
Plasma Therm Versaline LL ICP Deep Silicon Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Single wafer; Bosch process for Si etching; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; need a support wafer for through wafer etching, can be used for Isotropic Si Etching

Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
Plasma Therm Versaline LL ICP Dielectric Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Single wafer; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; Restrictions: Can not etch metals or metal oxides with no volatile by-products (shorting & arcing issues)

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Equipment name & Badger ID Technique Cleanliness Material Thickness Range Materials Lab Supplied Materials User Supplied Minimum Resolution Resist Objective Separation Process Temperature Range Chemicals Gases Accessories Available Substrate Size Substrate Type Maximum Load
Finetech Lambda
flipchipbonder
Flexible
°C - 400 °C
,
,
,
,
,
1
First Nano carbon nanotube CVD furnace
cvd-nanotube
Flexible
800 °C - 1100 °C
,
1x4" wafer or multiple pieces
Fisher Accuspin 24C
centrifuge
Flexible
Formlabs Form2 3D Printer
form2-3d-printer
Flexible
Multiple parts - depending on the final part size
Fujifilm Dimatix Ink Jet Printer
nanoinkjet
Flexible
Fumehood 1
fumehood1
Flexible
Fumehood 2
fumehood2
Flexible
Fumehood 3
fumehood3
Flexible
Fumehood 4
fumehood4
Flexible
Glovebox-l
glovebox-l
Flexible
Glovebox-r
glovebox-r
Flexible
GnP POLI-400L
cmp
Flexible
Headway 3 Manual Resist Spinner
headway3
Flexible
1 piece or wafer
Hummer V Sputter Coater
hummer
Flexible
Ika T18 Disperser
disperser
Flexible
Innotec Evaporator
Innotec
Flexible
,
,
22 four inch wafers
Jasco UV-Vis-NIR
jasco-uv-vis-nir
Flexible
Lesker Sputter
lesker-sputter
Flexible
,
,
,
,
,
,
,
,
,
1 4 inch wafer, 1 6 inch wafer
Lithography Solvent Bench
lithosolv
Flexible
,
,
,
,
,
,
,
,
Malvern Dynamic Light Scattering (DLS) Zetasizer
malvern-dls
Flexible

Integrating Sphere

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