The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Flexible" category.
Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Xplore Micro Compounder N/A |
Flexible |
0 °C - 400 °C
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Wet Bench Solvent Lithography lithosolv |
Flexible |
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Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
|
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25 4 inch wafers | |||||||||
Wet Bench Miscellaneous wbmiscres |
Flexible |
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Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Flexible |
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Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Flexible |
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Wet Bench Flexible Solvents wbflexsolv |
Flexible |
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Wet Bench Flexcorr 4 wbflexcorr-4 |
Flexible | ||||||||||||
Wet Bench Flexcorr 3 wbflexcorr-3 |
Flexible |
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Wet Bench Flexcorr 2 wbflexcorr-2 |
Flexible |
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Wet Bench Flexcorr 1 wbflexcorr-1 |
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Flexible |
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Voltera voltera |
Flexible | ||||||||||||
Tylan9 Forming Gas Anneal Furnace tylan9 |
Flexible |
250 °C - 1100 °C
|
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50 | |||||||||
Thinky AR-100 Mixer thinky-mixer |
Flexible | ||||||||||||
Thermoscientific Oven thermoscientific-oven |
Flexible | ||||||||||||
Technics Asher technics |
Flexible |
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Four 4" wafers to pieces, one 6" or 8" wafer | ||||||||||
Solidscape Wax 3D Printer 3d-wax-printer |
Flexible | ||||||||||||
Sinton Lifetime Tester sinton-lifetime-tester |
Flexible | ||||||||||||
Savannah ALD savannah |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 250 °C
|
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Samco PC300 Plasma Etch System samco |
Flexible |
20 ºC
|
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Four 4" wafers or two 6" wafers and one 8" wafer |