The "Clean" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Clean" category.
Equipment name & NEMO ID | Technique | Cleaning Required | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
|
, , , , , , |
25 4 inch wafers | |||||||||
Wet Bench Decontamination wbdecon |
Clean |
, , |
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Wet Bench CMOS Metal wbclean3 |
Semiclean |
, , |
25 wafers | ||||||||||
Wet Bench Clean_res-piranha wbclean_res-piranha |
Clean |
, , |
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Wet Bench Clean_res-hf wbclean_res-hf |
Clean |
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|||||||||||
Wet Bench Clean_res- hotphos wbclean_res-hotphos |
Clean |
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Wet Bench Clean 2 wbclean-2 |
Clean |
, , |
25 | ||||||||||
Wet Bench Clean 1 wbclean-1 |
Clean |
, , |
25 | ||||||||||
Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | |||||||
Tystar Bank 2 Tube 6 B2T6 Clean Oxide |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | |||||||
Tystar Bank 2 Tube 5 B2T5 Clean Oxide Anneal |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | |||||||
Tylanfga Forming Gas Anneal Furnace tylanfga |
Standard Metal Clean | Semiclean |
100.00 Å -
100.00 Å
|
250 °C - 800 °C
|
50 | ||||||||
Thermco3 Oxidation Furnace thermco 3 |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
700 °C - 1100 °C
|
50 | ||||||||
Tencor P2 Profilometer p2 |
Clean, Semiclean |
, , , , , , , , |
1 | ||||||||||
RTA AllWin 610 aw610_l |
Pre-Diffusion Clean | Clean |
21 °C - 1150 °C
|
, , |
1 wafer | ||||||||
Lesker2 Sputter lesker2-sputter |
Semiclean |
1.00 μm
|
°C - 800 °C
|
, , , , , , , , , |
one 4 inch wafer, one 6 inch wafer | ||||||||
Lam Research TCP 9400 Poly Etcher lampoly |
Clean, Semiclean |
, |
25 | ||||||||||
Intlvac Evaporator Intlvac_evap |
Clean, Semiclean |
0.00 -
0.50 μm
|
, , |
12 4 inch wafers, 2 6 inch wafers | |||||||||
Gasonics Aura Asher gasonics |
Clean, Semiclean | 25 | |||||||||||
Fiji 1 ALD fiji1 |
Semiclean |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
, , |