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SNF: Chemical Vapor Deposition

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Equipment name & Badger ID Training Required & Charges Cleanliness Lab Organization Location Notes
Epi2
epi2
AMAT Centurion Epitaxial Training Clean
SNF
SNF Cleanroom Paul G Allen L107

N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr

Fiji 1
fiji1
Fiji 1 and 2 Training Semiclean
SNF
SNF Cleanroom Paul G Allen L107
Fiji 2
fiji2
Fiji 1 and 2 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107
Fiji 3
fiji3
Fiji 3 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Restricted to non-conductive films only

MVD
mvd
MVD Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Reactor located inside glovebox

PlasmaTherm Versaline HDP CVD System
hdpcvd
PlasmaTherm Versaline HDP CVD System Training All
SNF
SNF Cleanroom Paul G Allen L107

To maintain cleanliness level there are cleans required for both the chamber and wafers prior to processing -

Substrates in clean category: Pre-Diffusion Clean

For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) .  Run Chamber clean (no dummies) and conditioning with clean dummies prior to run

Savannah
savannah
Savannah Training Flexible
SNF
SNF Cleanroom Paul G Allen L107
STS Plasma Enhanced CVD
sts
STS Plasma Enhanced CVD Training Flexible
SNF
SNF Cleanroom Paul G Allen L107
Teos2
teos2
Teos Deposition Furnace Training Clean
SNF
SNF Cleanroom Paul G Allen L107

Very conformal.

ThermcoLTO
thermcoLTO
Thermco LTO Deposition Furnace Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

limits on material vapor pressure

ThermcoNitride
thermconitride1
Thermco Nitride Deposition Furnace Training Clean
SNF
SNF Cleanroom Paul G Allen L107

Stociometric and low stress (~150mPa) programs available

ThermcoPoly1
thermcopoly1
Thermco Poly Deposition Furnace Training Clean
SNF
SNF Cleanroom Paul G Allen L107

Standard polysilicon deposition at 620C. P and N doping available. Amorphous Si programs available.

ThermcoPoly2
thermcopoly2
Thermco Poly Deposition Furnace Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Standard polysilicon deposition at 620C. P and N doping available.

TylanBPSG
tylanbpsg
TylanBPSG Deposition Furnace Training Clean, Semiclean
SNF
SNF Cleanroom Paul G Allen L107
Equipment name & Badger ID Technique Cleaning Required Cleanliness Material Thickness Range Materials Lab Supplied Minimum Resolution Objective Separation Process Temperature Range Gases Substrate Size Substrate Type Maximum Load
Epi2
epi2
Pre-Diffusion Clean Clean
50 Å - 3 μm
600 °C - 1200 °C
1
Fiji 1
fiji1
Semiclean
1 Å - 50 nm
24 °C - 350 °C
,
,
Fiji 2
fiji2
Flexible
1 Å - 50 nm
24 °C - 350 °C
,
,
,
,
,
,
,
,
,
,
,
,
Fiji 3
fiji3
Flexible
1 Å - 50 nm
24 °C - 350 °C
,
,
MVD
mvd
Flexible
1 Å - 50 nm
24 °C - 150 °C
PlasmaTherm Versaline HDP CVD System
hdpcvd
Special: See Notes All
500 Å - 4 μm
50 °C - 150 °C
1
Savannah
savannah
Flexible
1 Å - 50 nm
24 °C - 250 °C
,
,
,
,
,
,
,
,
,
,
,
,
STS Plasma Enhanced CVD
sts
Flexible
100 Å - 5 μm
350 ºC
Four 4 inch or one 6 inch or one 8 inch
Teos2
teos2
Pre-Diffusion Clean Clean
50 Å - 5 μm
450 °C - 680 °C
,
,
45
ThermcoLTO
thermcoLTO
Flexible
100 Å - 3 μm
300 °C - 450 °C
,
,
26
ThermcoNitride
thermconitride1
Pre-Diffusion Clean Clean
100 Å - 2 μm
785 °C - 850 °C
44
ThermcoPoly1
thermcopoly1
Pre-Diffusion Clean Clean
100 Å - 3 μm
525 °C - 650 °C
,
,
44
ThermcoPoly2
thermcopoly2
Pre-Diffusion Clean Flexible
100 Å - 3 μm
525 °C - 650 °C
44
TylanBPSG
tylanbpsg
Pre-Diffusion Clean, Standard Metal Clean Clean, Semiclean
100 Å - 3 μm
300 °C - 450 °C
,
,
26
Equipment name & Badger ID Location Image Overview Materials Lab Supplied Link to Training
Epi2
epi2
SNF Cleanroom Paul G Allen L107
Applied Materials Centura Epi2  tool in SNF

Epi2 is the the first chamber on the tool and...

AMAT Centurion Epitaxial Training
Fiji 1
fiji1
SNF Cleanroom Paul G Allen L107
photo of Fiji1 in SNF Cleanroom

Fiji1 is a load-locked, plasma-enabled atomic layer deposition (ALD) system....

Fiji 1 and 2 Training
Fiji 2
fiji2
SNF Cleanroom Paul G Allen L107
photo of Fiji2 in SNF Cleanroom

Fiji2 is a load-locked, plasma-enabled atomic layer deposition (ALD) system....

Fiji 1 and 2 Training
Fiji 3
fiji3
SNF Cleanroom Paul G Allen L107
photo of Fiji3 in SNF Cleanroom

The Fiji3 ALD system from Cambridge Nanotech/Ultratech is a plasma...

Fiji 3 Training
MVD
mvd
SNF Cleanroom Paul G Allen L107

MVD is a molecular vapor deposition (MVD) system. It is...

MVD Training
PlasmaTherm Versaline HDP CVD System
hdpcvd
SNF Cleanroom Paul G Allen L107
PlasmaTherm Versaline HDP CVD System Training
Savannah
savannah
SNF Cleanroom Paul G Allen L107
photo of Savannah in SNF cleanroom

Savannah is a thermal atomic layer deposition (ALD) system. It...

Savannah Training
STS Plasma Enhanced CVD
sts
SNF Cleanroom Paul G Allen L107
STS Plasma Enhanced CVD Training
Teos2
teos2
SNF Cleanroom Paul G Allen L107

Teos2 furnace allows LPCVD deposition of silicon dioxide, using tetraethyl...

Teos Deposition Furnace Training
ThermcoLTO
thermcoLTO
SNF Cleanroom Paul G Allen L107

Silicon dioxide (SiO2) is deposited at between 300 and 450C...

Thermco LTO Deposition Furnace Training
ThermcoNitride
thermconitride1
SNF Cleanroom Paul G Allen L107

Silicon nitride (or nitride or Si3N4) is deposited at moderately...

Thermco Nitride Deposition Furnace Training
ThermcoPoly1
thermcopoly1
SNF Cleanroom Paul G Allen L107

Polycrystalline silicon (also called "poly-Si" or "poly") is deposited at...

Thermco Poly Deposition Furnace Training
ThermcoPoly2
thermcopoly2
SNF Cleanroom Paul G Allen L107

Same as ThermcoPoly1 but in the "flexible (gold-contaminated)" group.  ...

Thermco Poly Deposition Furnace Training
TylanBPSG
tylanbpsg
SNF Cleanroom Paul G Allen L107

Silicon dioxide (SiO2) is deposited at between 300 and 450C...

TylanBPSG Deposition Furnace Training