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SNF: Characterization and Testing

mr_equipment

Specifications

Equipment name & NEMO ID	Technique	Cleanliness	Material Thickness Range	Sample Size Limits	Substrate Size	Substrate Type	Maximum Load
Flexus 2320 Stress Tester stresstest	Characterization > Film Stress Measurement	All			3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)	1
Nanospec 210XP nanospec2	Characterization > Reflectometry	All			Pieces 2" 3" 4" 6"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)
Prometrix Resistivity Mapping System prometrix	Characterization > Sheet Resistance Measurement	All			2" 3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)	1
Reflectance Spectrometer Filmetrics F40 filmetrics	Characterization > Reflectometry	All					one piece or wafer
SEM -Zeiss Merlin sem-merlin	Characterization > Surface Analysis > Microscopy	All	0.00 mm - 35.00 mm	6 in wafer	Pieces 2" 3" 4" 6" Disks	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC) , (GaN) , (III-V) , (GaAs) , (LiNb)
Tencor P2 Profilometer p2	Characterization > Surface Analysis > Profilometer > Step Profile	Clean, Semiclean			Pieces 2" 3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)	1
Woollam woollam	Characterization > Ellipsometry	All			Pieces 2" 3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC) , (GaN) , (III-V) , (GaAs) , (Various) , (Various) , (LiNb) , (Various)	1

Summary

Equipment name & NEMO ID	Training Required & Charges	Cleanliness	Location	Notes
Flexus 2320 Stress Tester stresstest	Stress Tester Flexus 2320 Training	All	SNF Cleanroom Paul G Allen L107
Nanospec 210XP nanospec2	Nanospec Training	All	SNF Exfab Paul G Allen 104 Stinson	Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã
Prometrix Resistivity Mapping System prometrix	Prometrix Training	All	SNF Cleanroom Paul G Allen L107	3 Probe Heads for different cleanliness groups.
Reflectance Spectrometer Filmetrics F40 filmetrics	Reflectance Spectrometer Filmetrics F40 Training	All	SNF Cleanroom Paul G Allen L107
SEM -Zeiss Merlin sem-merlin	SEM-Merlin Training	All	SNF Exfab Paul G Allen 104 Stinson
Tencor P2 Profilometer p2	Tencor P2 Profilometer Training	Clean, Semiclean	SNF Cleanroom Paul G Allen L107	Step height measurement range 500 Å to 80 µm
Woollam woollam	Woollam Training	All	SNF Cleanroom Paul G Allen L107

Equipment name & NEMO ID	Training Required & Charges	Cleanliness	Location	Notes
Flexus 2320 Stress Tester stresstest	Stress Tester Flexus 2320 Training	All	SNF Cleanroom Paul G Allen L107
Nanospec 210XP nanospec2	Nanospec Training	All	SNF Exfab Paul G Allen 104 Stinson	Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã
Prometrix Resistivity Mapping System prometrix	Prometrix Training	All	SNF Cleanroom Paul G Allen L107	3 Probe Heads for different cleanliness groups.
Reflectance Spectrometer Filmetrics F40 filmetrics	Reflectance Spectrometer Filmetrics F40 Training	All	SNF Cleanroom Paul G Allen L107
SEM -Zeiss Merlin sem-merlin	SEM-Merlin Training	All	SNF Exfab Paul G Allen 104 Stinson
Tencor P2 Profilometer p2	Tencor P2 Profilometer Training	Clean, Semiclean	SNF Cleanroom Paul G Allen L107	Step height measurement range 500 Å to 80 µm
Woollam woollam	Woollam Training	All	SNF Cleanroom Paul G Allen L107

Equipment name & NEMO ID	Technique	Cleanliness	Material Thickness Range	Sample Size Limits	Substrate Size	Substrate Type	Maximum Load
Flexus 2320 Stress Tester stresstest	Characterization > Film Stress Measurement	All			3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)	1
Nanospec 210XP nanospec2	Characterization > Reflectometry	All			Pieces 2" 3" 4" 6"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)
Prometrix Resistivity Mapping System prometrix	Characterization > Sheet Resistance Measurement	All			2" 3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)	1
Reflectance Spectrometer Filmetrics F40 filmetrics	Characterization > Reflectometry	All					one piece or wafer
SEM -Zeiss Merlin sem-merlin	Characterization > Surface Analysis > Microscopy	All	0.00 mm - 35.00 mm	6 in wafer	Pieces 2" 3" 4" 6" Disks	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC) , (GaN) , (III-V) , (GaAs) , (LiNb)
Tencor P2 Profilometer p2	Characterization > Surface Analysis > Profilometer > Step Profile	Clean, Semiclean			Pieces 2" 3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)	1
Woollam woollam	Characterization > Ellipsometry	All			Pieces 2" 3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC) , (GaN) , (III-V) , (GaAs) , (Various) , (Various) , (LiNb) , (Various)	1