SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
The MOCVD lab houses two aixtron MOCVD tools for epitaxial growth of compound semiconductors, one for III-V materials like GaAs, the other for III-N materials like GaN. Sample size: pieces, 50mm wafers and 100mm wafers.
Equipment name & Badger ID | Training Required & Charges | Cleanliness | Lab Organization | Location | Notes |
---|---|---|---|---|---|
Aix-ccs aix-ccs |
Aixtron MOCVD - III-N system training | Clean (MOCVD) | SNF MOCVD Paul G Allen 213XA |
N and P doping available. |
|
Aix200 aix200 |
Aixtron MOCVD - III-V system training | Flexible | SNF MOCVD Paul G Allen 213XA |
N and P doping available. |
Equipment name & Badger ID | Technique | Cleaning Required | Cleanliness | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Objective Separation | Process Temperature Range | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|
Aix-ccs aix-ccs |
Special: See Notes | Clean (MOCVD) |
0 -
5 μm
|
|
|
400 °C - 1300 °C
|
, , , |
4"x1, 2"X3, pieces | ||||
Aix200 aix200 |
Pre-Diffusion Clean, Special: See Notes | Flexible |
0 -
5 μm
|
|
|
300 °C - 800 °C
|
, , , |
4"x1 wafer or 2"x1 wafer or 4 pieces |