Lampoly HBr/Cl2/O2 etching of silicon oxide on lithium niobate
PROM Request Title:
Lampoly HBr/Cl2/O2 etching of silicon oxide on lithium niobate
PROM Date:
08/18/2018
PROM Decision:
Request approved. VPD Analysis complete.
Link to PROM Request and supporting documentation:
Equipment List:
PlasmaTherm Shuttlelock PECVD System (ccp-dep)
Lam Research TCP 9400 Poly Etcher (lampoly)
PROM Request Summary:
Request to introduce LiN into a clean category etcher.