The 110°C Oven bakes the wafers with resist at 110ºC after the development, called post-bake.
Cleanliness:
All
Lab Facility:
SNF Cleanroom
Primary Trainer:
Cliff Knollenberg
Backup Trainer(s):
Uli Thumser
Primary Maintenance:
Mario Vilanova
Backup Maintenance:
Gary Sosa
Steps to become a tool user
Become a member of SNF.
"All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here:All Litho class.
Study the relevant operating procedures:
Oven 110C
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
Contact the primary trainer: Cliff Knollenberg
Location:
SNF Cleanroom Paul G Allen L107
NEMO Area:
SNF: Photolithography
NEMO ID:
oven110
Pieces
2 inch wafer
3 inch wafer
4 inch wafer
6 inch wafer
Notes:
Bakes wafers with resist after the development, called post-bake.