Published on Stanford Nanofabrication Facility (https://snfexfab.stanford.edu)

Home > Laurell Manual Resist Spinner (laurell-R)

Cleanliness: 
All [1]
Lab Facility: 
SNF Cleanroom [2]
Training Charges: 
1.00 hours
Primary Trainer: 
Cliff Knollenberg [3]
Backup Trainer(s): 
Swaroop Kommera [4]
Primary Maintenance: 
Mario Vilanova [5]
Backup Maintenance: 
Gary Sosa [6]

Steps to become a tool user

  1. Become a member of SNF [7].
  1. "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu [8] to sign up for the All Litho class. Read more here: All Litho class [9].
  2. Read the relevant operating procedures:
    • Laurell Manual Resist Spinner - R [10]
  3. Contact the primary trainer:
    Cliff Knollenberg [3]
    .
Location: 
SNF Cleanroom Paul G Allen L107 [11]
Badger Area: 
SNF: Photolithography [12]
Badger ID: 
laurell-R
Resist: 
Resists [13]
SU-8 [14]
Lift Off Layer [15]
Pieces [16]
2 inch wafer [17]
3 inch wafer [18]
4 inch wafer [19]
6 inch wafer [20]
Notes: 

SU-8, LOL, Ebeam resists allowed. No Acetone allowed. 

PMMA [21]

Source URL (modified on 29 Jul 2020 - 12:30 am): https://snfexfab.stanford.edu/guide/equipment/laurell-manual-resist-spinner-laurell-r

Links
[1] https://snfexfab.stanford.edu/snf/cleanliness/all
[2] https://snfexfab.stanford.edu/snf/lab-organiation-facility/snf/snf-cleanroom
[3] https://snfexfab.stanford.edu/snf/people/cliff-knollenberg
[4] https://snfexfab.stanford.edu/snf/people/swaroop-kommera
[5] https://snfexfab.stanford.edu/snf/people/mario-vilanova
[6] https://snfexfab.stanford.edu/snf/people/gary-sosa
[7] https://snfexfab.stanford.edu/snf/join/how-to-join-snf
[8] mailto:all-litho-training@lists.stanford.edu
[9] https://snfexfab.stanford.edu/all-litho-class
[10] https://snfexfab.stanford.edu/docs/operating-instructions/laurell-manual-resist-spinner-r
[11] https://snfexfab.stanford.edu/snf/locations/snf-cleanroom-paul-g-allen-l107
[12] https://snfexfab.stanford.edu/snf/badger-area/snf-photolithography
[13] https://snfexfab.stanford.edu/guide/chemicals/resists
[14] https://snfexfab.stanford.edu/guide/chemicals/resists/su-8
[15] https://snfexfab.stanford.edu/guide/chemicals/resists/lift-off-layer
[16] https://snfexfab.stanford.edu/snf/substrate-size/pieces
[17] https://snfexfab.stanford.edu/snf/substrate-size/2-inch-wafer
[18] https://snfexfab.stanford.edu/snf/substrate-size/3-inch-wafer
[19] https://snfexfab.stanford.edu/snf/substrate-size/4-inch-wafer
[20] https://snfexfab.stanford.edu/snf/substrate-size/6-inch-wafer
[21] https://snfexfab.stanford.edu/guide/chemicals/resists/pmma