The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen).
Cleanliness:
Flexible
Lab Facility:
SNF Cleanroom
Training Charges:
0.50 hours
Primary Trainer:
Lavendra Yadav Mandyam
Backup Trainer(s):
Uli Thumser
Primary Maintenance:
Elmer Enriquez
Backup Maintenance:
Mike Dickey
Steps to become a tool user
-
Become a member of SNF.
- Read the relevant operating procedures:
- Matrix Plasma Asher Operating Instructions
- Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
Print the SNF Training Shadowing Form on clean room paper. - Contact the primary trainer:. Submit the shadowing form to get qualified.Lavendra Yadav Mandyam
Location:
SNF Cleanroom Paul G Allen L107
Badger Area:
SNF: Dry Etching
Badger ID:
matrix
4 inch wafer
(O2)
Maximum Load:
25
Notes:
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Chuck temperature controls wafer heating.
Silicon
Silicon Germanium
Quartz
Sapphire
Glass
Primary Materials Etched:
()
Other Materials Etched:
Polyimide