About PPE: alcohol wipe down before and after each use. In addition, face shields will be placed in the steamer for 1 1/2 hours. Aprons will be user owned, not shared.
The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for 3", 4", and 6" Si, SiGe, and quartz substrates and is primarily used for stripping photoresist, removing scribe dust and wet oxide etching. Wafers may not contain or have ever contained any metals, nor been exposed to equipment which may pose this contamination risk. This bench contains two hot pots for 90% sulfuric acid/hydrogen peroxide ("piranha") for stripping resist, two Teflon tanks containing 50:1 HF, 20:1 BOE, or 6:1 BOE for etching oxide, one hot pot for phosphoric acid, three automatic dump rinsers and two spin/rinse dryers.
Cleanliness:
Clean
Lab Facility:
SNF Cleanroom
Training Charges:
2.25 hours
Primary Trainer:
Uli Thumser
Primary Maintenance:
Jim Haydon
Backup Maintenance:
Gary Sosa
Steps to become a tool user
-
Become a member of SNF.
- Read the relevant operating procedures:
- Wet Bench Clean Piranha
- Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
Print the SNF Training Shadowing Form and the Wet Bench Checklist on clean room paper. - Sign up for the relevant training scheduled in.SNF Training Calendar
- Contact the primary trainer:.Uli Thumser
Notes:
covered in wbclean-1 and-2
Location:
SNF Cleanroom Paul G Allen L107
Badger Area:
SNF: Wet Benches
Badger ID:
wbclean_res-piranha
3 inch wafer
4 inch wafer
6 inch wafer
Notes:
Resist will be removed
Silicon
Silicon Germanium
Quartz
9:1 Piranha Solution