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Home > Wet Bench Decontamination (wbdecon)

About PPE: alcohol wipe down before and after each use. In addition, face shields will be placed in the steamer for 1 1/2 hours. Aprons will be user owned, not shared.

This part of the bench (left side), wbdecon, has one HCl bath, dump rinser, and SRD for the decontamination of 3", 4" or 6 " KOH-etched silicon wafers before being allowed back into the clean equipment group.

Cleanliness: 
Clean [1]
Lab Facility: 
SNF Cleanroom [2]
Primary Trainer: 
Uli Thumser [3]
Primary Maintenance: 
Jim Haydon [4]
Backup Maintenance: 
Gary Sosa [5]

Steps to become a tool user

  1. Become a member of SNF [6].
  1. Read the relevant operating procedures:
  2. Please read the 'KOH decontamination at wbdecon' [8] part of this page.
  3. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists [9]. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form [10] on clean room paper.
  4. Contact the primary trainer:
    .
Location: 
SNF Cleanroom Paul G Allen L107 [11]
Badger Area: 
SNF: Wet Benches [12]
Badger ID: 
wbdecon
3 inch wafer [13]
4 inch wafer [14]
6 inch wafer [15]
Notes: 

KOH or wafersaw or post-cmp decontamination

Silicon [16]
Silicon Germanium [17]
Quartz [18]
Standard Clean 2 [19]
Source URL (modified on 6 Dec 2021 - 1:29 pm): https://snfexfab.stanford.edu/guide/equipment/wet-bench-decontamination-wbdecon

Links
[1] https://snfexfab.stanford.edu/snf/cleanliness/clean
[2] https://snfexfab.stanford.edu/snf/lab-organiation-facility/snf/snf-cleanroom
[3] https://snfexfab.stanford.edu/snf/people/uli-thumser
[4] https://snfexfab.stanford.edu/snf/people/jim-haydon
[5] https://snfexfab.stanford.edu/snf/people/gary-sosa
[6] https://snfexfab.stanford.edu/snf/join/how-to-join-snf
[7] https://snfexfab.stanford.edu/docs/operating-instructions/wet-bench-decontamination
[8] http://docs.google.com/document/d/e/2PACX-1vRyJcgcSvcd87uFrPXFf2rvQxzVLHa304uUp5TBuJfq9QV3pWoOov0sBDtPkjeQ5-Jttpkcntsjm1Fg/pub
[9] https://snfexfab.stanford.edu/snf/join/discussion-lists
[10] https://snfexfab.stanford.edu/guide/training/snf-training-shadowing-form
[11] https://snfexfab.stanford.edu/snf/locations/snf-cleanroom-paul-g-allen-l107
[12] https://snfexfab.stanford.edu/snf/badger-area/snf-wet-benches
[13] https://snfexfab.stanford.edu/snf/substrate-size/3-inch-wafer
[14] https://snfexfab.stanford.edu/snf/substrate-size/4-inch-wafer
[15] https://snfexfab.stanford.edu/snf/substrate-size/6-inch-wafer
[16] https://snfexfab.stanford.edu/guide/substrate-type/silicon
[17] https://snfexfab.stanford.edu/guide/substrate-type/silicon-germanium
[18] https://snfexfab.stanford.edu/guide/substrate-type/quartz
[19] https://snfexfab.stanford.edu/guide/chemicals/acids/standard-clean-2