About PPE: alcohol wipe down before and after each use. In addition, face shields will be placed in the steamer for 1 1/2 hours. Aprons will be user owned, not shared.
This part of the bench (left side), wbdecon, has one HCl bath, dump rinser, and SRD for the decontamination of 3", 4" or 6 " KOH-etched silicon wafers before being allowed back into the clean equipment group.
KOH or wafersaw or post-cmp decontamination
Links
[1] https://snfguide.stanford.edu/snf/cleanliness/clean
[2] https://snfguide.stanford.edu/guide/lab-organization-facility/snf/snf-cleanroom
[3] https://snfguide.stanford.edu/guide/people/uli-thumser
[4] https://snfguide.stanford.edu/guide/people/jim-haydon
[5] https://snfguide.stanford.edu/guide/people/gary-sosa
[6] https://snfguide.stanford.edu/forwards-to-snf-was-how-to-join-snf
[7] https://snfguide.stanford.edu/guide/docs/operating-instructions/wet-bench-decontamination
[8] http://docs.google.com/document/d/e/2PACX-1vRyJcgcSvcd87uFrPXFf2rvQxzVLHa304uUp5TBuJfq9QV3pWoOov0sBDtPkjeQ5-Jttpkcntsjm1Fg/pub
[9] https://snfguide.stanford.edu/guide/training/snf-training-shadowing-form
[10] https://snfguide.stanford.edu/guide/locations/snf-cleanroom-paul-g-allen-l107
[11] https://snfguide.stanford.edu/snf/badger-area/snf-wet-benches
[12] https://snfguide.stanford.edu/guide/substrate-size/3-inch-wafer
[13] https://snfguide.stanford.edu/guide/substrate-size/4-inch-wafer
[14] https://snfguide.stanford.edu/snf/substrate-size/6-inch-wafer
[15] https://snfguide.stanford.edu/guide/substrate-type/silicon
[16] https://snfguide.stanford.edu/guide/substrate-type/silicon-germanium
[17] https://snfguide.stanford.edu/guide/substrate-type/quartz
[18] https://snfguide.stanford.edu/guide/chemicals/acids/standard-clean-2