About PPE: alcohol wipe down before and after each use. In addition, face shields will be placed in the steamer for 1 1/2 hours. Aprons will be user owned, not shared.
This part of the bench (right side) is the Wet Bench CMOS Metal (wbclean3). It replaces some parts of the former wbmetal bench for processing of silicon wafers with standard metals, part of the "semiclean" cleanliness group. This station has one room temperature bath for peroxide solutions, one aluminum etch hot pot, two HF tanks for oxide etching, one contains 50:1 HF, and the second tank contains either 6:1 or 20:1 BOE, and one dump rinser. The SRD on the left side of this bench is used for both sides.
Al, Ti, or W wet etching or oxide etching