Published on Stanford Nanofabrication Facility (https://snfexfab.stanford.edu)

Home > PlasmaTherm Shuttlelock PECVD System (ccp-dep)

Cleanliness: 
All
Cleaning Required: 
Special: See Notes
Lab Facility: 
SNF Cleanroom
Training Charges: 
1.00 hours
Primary Trainer: 
Lavendra Yadav Mandyam
Primary Maintenance: 
Elmer Enriquez
Backup Maintenance: 
Mike Dickey

Steps to become a tool user

  1. Become a member of SNF.
  1. Check the training calendar for any scheduled training:
    SNF Training Calendar
    .
  2. Contact the primary trainer,
    Lavendra Yadav Mandyam
    , to sign up for the training or to schedule a training if none is scheduled.
  3. Read the relevant operating procedures:
    • PlasmaTherm PECVD CCP Dep Operating Instructions
  4. You can also shadow an experienced user to get qualified on this tool. Complete the shadowing form. Get the form signed by the trainer.
  5. After attending the training with an experienced user, submit the completed shadowing form to the primary trainer.  If the primary trainer is the one who trained you, no need to fill out the shadowing form.  Get qualified.
Location: 
SNF Cleanroom Paul G Allen L107
Badger ID: 
ccp-dep
100.0
Å
4.0
μm
4 inch wafer
(5% SiH4 in He)
(NH3)
(He)
(CH4)
(N2)
(N2O)
(SF6)
Maximum Load: 
4
Notes: 

To maintain cleanliness level, cleans of both the chamber and wafers are required prior to processing -

Substrates in clean category: Pre-Diffusion Clean

For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run


Source URL (modified on 29 Jul 2020 - 12:28 am): https://snfexfab.stanford.edu/guide/equipment/plasmatherm-shuttlelock-pecvd-system-ccp-dep