Spin coat substrates with graphene
PROM Request Title:
Spin coat substrates with graphene
PROM Date:
02/11/2014
PROM Decision:
Approved for Laurell spinner OUTSIDE of SNF. No loose nanoparticles to be spun inside of cleanroom.
Link to PROM Request and supporting documentation:
Equipment List:
Headway Manual Resist Spinner (headway2)
Laurell Manual Resist Spinner (laurell-R)
PROM Request Summary:
Request to use Headway spinner in SNF to spin coat graphene particles on substrates.