Clean Processing of Aluminum post CMP
PROM Request Title:
Clean Processing of Aluminum post CMP
PROM Date:
02/21/2014
PROM Decision:
Approved to use the standard metal clean for post CMP clean and CCP or HD CVD oxide tools in clean contamination state.
Link to PROM Request and supporting documentation:
Equipment List:
PlasmaTherm Shuttlelock PECVD System (ccp-dep)
CMP GnP POLI-400L (cmp)
Wet Bench Clean 1 (wbclean-1)
Lam Research TCP 9400 Poly Etcher (lampoly)
PROM Request Summary:
Clean contamination category processing of Aluminum post CMP. Requires Al compatible clean (standard decon procedure includes SC2 which etches Al).