Etching Polyacrylonitrile-Lithium Perchlorate membrane with Au mask
PROM Request Title:
Etching Polyacrylonitrile-Lithium Perchlorate membrane with Au mask
PROM Date:
03/17/2014
PROM Decision:
Approved for documented runs. Additional runs or larger substrates will require review by PROM committee.
Link to PROM Request and supporting documentation:
Equipment List:
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox)
PROM Request Summary:
Request to use PAN-LiClO4 film in PT-OX. Concern is using Li compounds in the shared equipment.