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Contamination Study of Semi-Clean SiGe in LAMpoly

PROM Request Title: 
Contamination Study of Semi-Clean SiGe in LAMpoly
PROM Date: 
02/02/2015
PROM Decision: 
Approved for study. Resubmission is required after data is collected. // Update 2/18/15: TiN layer deposition at Berkeley is approved due to extended Fiji1 downtime. // Update 3/31/15: Contamination data appended. Process flow is approved.
Link to PROM Request and supporting documentation: 
Contamination Study of Semi-Clean SiGe in LAMpoly [1]
Equipment List: 
Lam Research TCP 9400 Poly Etcher (lampoly)
GnP POLI-400L (cmp)
AMAT P5000 Etcher (p5000etch)
Fiji 1 (fiji1)
PROM Request Summary: 
Request to perform contamination study of Semi-Clean SiGe in LAMpoly.

Source URL (modified on 17 Aug 2022 - 5:42 pm): https://snfexfab.stanford.edu/snf/prom-requests/contamination-study-of-semi-clean-sige-in-lampoly#comment-0

Links
[1] https://www.google.com/url?q=https%3A//docs.google.com/document/d/e/2PACX-1vSrT3VQ2yW3XoBsM_NI2CpfEq0od7ODC0hu6NtzDvw3NO-XyvSUsBYjoCdNGMg0B5tDR4jsPV9mOjaB/pub&sa=D&source=editors&ust=1660786973288743&usg=AOvVaw29ZvNH975Kl6kTnsfFz3OM